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Support, vibration isolation system, lithographic apparatus, object measurement apparatus, device manufacturing method
Patent number: 11828344
Abstract: The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.
Type: Grant
Filed: July 9, 2020
Date of Patent: November 28, 2023
Assignee: ASML NETHERLANDS B.V.
Inventors: Jeroen Johan Maarten Van De Wijdeven, Johannes Petrus Martinus Bernardus Vermeulen, Jeroen Pieter Starreveld, Stan Henricus Van Der Meulen
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Projection system and lithographic apparatus comprising said projection system
Patent number: 11550227
Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.
Type: Grant
Filed: December 13, 2019
Date of Patent: January 10, 2023
Assignee: ASML Netherlands B.V.
Inventors: Marinus Engelbertus Cornelis Mutsaers, Robertus Johannes Marinus De Jongh, Jeroen Pieter Starreveld
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SUPPORT, VIBRATION ISOLATION SYSTEM, LITHOGRAPHIC APPARATUS, OBJECT MEASUREMENT APPARATUS, DEVICE MANUFACTURING METHOD
Publication number: 20220290734
Abstract: The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.
Type: Application
Filed: July 9, 2020
Publication date: September 15, 2022
Applicant: ASML Netherlands B.V.
Inventors: Jeroen Johan Maarten VAN DE WIJDEVEN, Johannes VERMEULEN, Jeroen Pieter STARREVELD, Stan Henricus VAN DER MEULEN
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Vibration isolation system and lithographic apparatus
Patent number: 11422477
Abstract: The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.
Type: Grant
Filed: April 23, 2019
Date of Patent: August 23, 2022
Assignee: ASML Netherlands B.V.
Inventors: Roy Hendrikus Emilie Maria Jacobs, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Johannes Petrus Martinus Bernardus Vermeulen
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PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SAID PROJECTION SYSTEM
Publication number: 20220082947
Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.
Type: Application
Filed: December 13, 2019
Publication date: March 17, 2022
Applicant: ASML Netherlands B.V.
See Also»Vogel ist tot« und »Kurz vor dem Rand« für den Deutschen Jugendliteraturpreis 2024 nominiert – Jacoby & StuartHow Jean van de Velde famously threw away The OpenVogel ist tot – Jacoby & StuartInventors: Marinus Engelbertus Cornelis MUTSAERS, Robertus Johannes Marinus DE JONGH, Jeroen Pieter STARREVELD
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Frame assembly, lithographic apparatus and device manufacturing method
Patent number: 11269262
Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.
Type: Grant
Filed: April 4, 2019
Date of Patent: March 8, 2022
Assignee: ASML Netherlands B.V.
Inventors: Hans Butler, Joep Sander De Beer, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
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Pneumatic support device and lithographic apparatus with pneumatic support device
Patent number: 11169450
Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit.
Type: Grant
Filed: March 18, 2019
Date of Patent: November 9, 2021
Assignee: ASML Netherlands B.V.
Inventors: Hans Butler, Joep Sander De Beer, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
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Frame Assembly, Lithographic Apparatus and Device Manufacturing Method
Publication number: 20210240090
Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.
Type: Application
Filed: April 4, 2019
Publication date: August 5, 2021
Applicant: ASML Netherlands B.V.
Inventors: Hans BUTLER, Joep Sander DE BEER, Cornelius Adrianus Lambertus DE HOON, Jeroen Pieter STARREVELD, Martinus VAN DUIJNHOVEN, Maurice Willem Jozef Etiënn WIJCKMANS
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Pneumatic Support Device and Lithographic Apparatus with Pneumatic Support Device
Publication number: 20210080834
Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit.
Type: Application
Filed: March 18, 2019
Publication date: March 18, 2021
Applicant: ASML Netherlands B.V.
Inventors: Hans BUTLER, Joep Sander DE BEER, Cornelius Adrianus Lambertus DE HOON, Jeroen Pieter STARREVELD, Martinus VAN DUIJNHOVEN, Maurice Willem Jozef Etiënn WIJCKMANS
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Vibration Isolation System and Lithographic Apparatus
Publication number: 20210080835
Abstract: The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.
Type: Application
Filed: April 23, 2019
Publication date: March 18, 2021
Applicant: ASML Netherlands B.V.
Inventors: Roy Hendrikus Emilie Maria JACOBS, Cornelius Adrianus Lambertus DE HOON, Jeroen Pieter STARREVELD, Johannes Petrus Martinus Ber VERMEULEN
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Lithographic apparatus, lithographic projection apparatus and device manufacturing method
Patent number: 10838312
Abstract: The present invention relates to a lithographic apparatus, comprising: —a primary frame (10) which is provided with a functional unit (11, 12, 14), —a secondary frame (20), —a primary frame support (30), which is adapted to support the primary frame onto the secondary frame, —a flexible utility connection (40), adapted to connect the functional unit to an auxiliary system (51, 52, 53), —a vibration isolation body (60) having a body mass, which is moveably connected to the secondary frame by a flexible passive body support (61) having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.
Type: Grant
Filed: January 30, 2018
Date of Patent: November 17, 2020
Assignee: ASML Netherlands B.V.
Inventors: Jeroen Pieter Starreveld, Maurice Willem Jozef Etiënne Wijckmans
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Vibration isolator, lithographic apparatus and device manufacturing method
Patent number: 10816910
Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator part arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.
Type: Grant
Filed: February 3, 2017
Date of Patent: October 27, 2020
Assignee: ASML Netherlands B.V.
Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etienne Wijckmans
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LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD
Publication number: 20200057379
Abstract: The present invention relates to a lithographic apparatus, comprising: a primary frame (10) which is provided with a functional unit (11, 12, 14), a secondary frame (20), a primary frame support (30), which is adapted to support the primary frame onto the secondary frame, a flexible utility connection (40), adapted to connect the functional unit to an auxiliary system (51, 52, 53), a vibration isolation body (60) having a body mass, which is moveably connected to the secondary frame by a flexible passive body support (61) having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.
Type: Application
Filed: January 30, 2018
Publication date: February 20, 2020
Inventors: Jeroen Pieter STARREVELD, Maurice Willem Jozef Etiënne WIJCKMANS
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Lithographic apparatus and device manufacturing method
Patent number: 10503086
Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.
Type: Grant
Filed: December 7, 2016
Date of Patent: December 10, 2019
Assignee: ASML NETHERLANDS B.V.
Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etiënne Wijckmans
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VIBRATION ISOLATOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Publication number: 20190049852
Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator pan arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.
Type: Application
Filed: February 3, 2017
Publication date: February 14, 2019
Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etienne Wijckmans
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LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Publication number: 20190011838
Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.
Type: Application
Filed: December 7, 2016
Publication date: January 10, 2019
Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Fransiscus Mathijs JACOBS, Pavel KAGAN, Jeroen Pieter STARREVELD, Maurice Willem Jozef Etiënne WIJCKMANS
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Support device, lithographic apparatus and device manufacturing method
Patent number: 9977349
Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.
Type: Grant
Filed: December 18, 2014
Date of Patent: May 22, 2018
Assignee: ASML NETHERLANDS B.V.
Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Ingmar August Kerp, Pieter Johannes Gertrudis Meijers, Jeroen Pieter Starreveld, Derk Ten Hoopen, Martinus Van Duijnhoven, Edward Hage, Evert Hendrik Jan Draaijer, Wesley Ooms
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Imprint lithographic apparatus and imprint lithographic method
Patent number: 9715171
Abstract: An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.
Type: Grant
Filed: December 9, 2010
Date of Patent: July 25, 2017
Assignee: ASML NETHERLANDS B.V.
Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marc Wilhelmus Maria Van Der Wijst, Jeroen Pieter Starreveld, Cornelius Adrianus Lambertus De Hoon, Francois Xavier Debiesme
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SUPPORT DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Publication number: 20160334718
Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.
Type: Application
Filed: December 18, 2014
Publication date: November 17, 2016
Applicant: ASML NETHERLANDS B.V.
Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, INgmar August KERP, Pieter Johannes Gertrudis MEIJERS, Jeroen Pieter STARREVELD, Derk TEN HOOPEN, Martinus VAN DUIJNHOVEN, Edward HAGE, Evert Hendrik Jan DRAAIJER, Wesley OOMS
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Lithographic apparatus and stage system
Patent number: 9097990
Abstract: A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.
Type: Grant
Filed: February 23, 2012
Date of Patent: August 4, 2015
Assignee: ASML NETHERLANDS B.V.
Inventors: Jan-Gerard Cornelis Van Der Toorn, Marcel Koenraad Marie Baggen, Stefan Geerte Kruijswijk, Jeroen Pieter Starreveld, Michael Johannes Vervoordeldonk, Mark Constant Johannes Baggen
FAQs
Who is the inventor of a patent? ›
In patent law, an inventor is the person, or persons in United States patent law, who contribute to the claims of a patentable invention.
What is the invention and law of patents? ›Patents are the most generalized way for protecting the rights of inventors. A patent is an exclusive right granted by the state for the protection of an invention. The patent grants to its holder the exclusive right to use or exploit the invention and prevent third parties from using it without consent.
What is the difference between a patent and an invention? ›Sometimes an invention is more of a progressive step from a pre-existing model or idea and is commonly known as an innovation. A patent, however, is a set of exclusive rights granted by the government to an inventor for a fixed period of time in exchange for a disclosure of an invention.
What are patents and their role in protecting inventions? ›A patent protects an invention by allowing its inventor — or the group who owns the patent — control over who may use the invention. Patent applications are adjudicated by the United States Patent and Trademark Office (USPTO) and are valid for 20 years.
Who is the youngest patent inventor? ›Samuel Thomas Houghton is a British inventor. In April 2008, at the age of 5, he received a patent for his "Sweeping Device With Two Heads" invention. He is thought to be the youngest person to have been granted a patent for their invention.
Who has patent number 1? ›The first U.S. patent was granted to Samuel Hopkins for a process of making potash, an ingredient used in fertilizer on July 31. President George Washington signed the first patent.
What inventions are not patentable? ›inventions being frivolous or contrary to public order, morality, public health, the environment, etc. scientific discoveries. mere discoveries of new forms of known substances. methods of agriculture or horticulture.
Do I need a patent for my invention? ›In order to be sure that your product or service will not infringe another party's prior patent, you need a clearance or freedom to operate opinion (to find out more about his option click here). In order to prevent others from copying and selling your invention you need a patent.
Can you sell an invention without a patent? ›Technically, yes, you can sell an idea to a company without a patent. However, this is where we circle back to entering into an NDA contract before sharing said idea, as mentioned previously. This would be your last line of defense to protect your idea, though, unfortunately, many companies won't enter into an NDA.
How do I know if my invention is patentable? ›In order for your invention to qualify for patent eligibility, it must cover subject matter that Congress has defined as patentable. According to USPTO this means the subject matter should be any "new and useful" process, machine, manufacture or composition of matter.
Is having a patent impressive? ›
Similarly, patents are viewed by college admissions as a highly sought-after distinction of creativity and technical capability of its inventor.
How much does a patent cost? ›Need Help? A patent attorney will usually charge between $8,000 and $10,000 for a patent application, but the cost can be higher. In most cases, you should budget between $15,000 and $20,000 to complete the patenting process for your invention.
Can a patent protect an idea? ›Usually, a patent can protect your idea for up to 20 years. Once the patent has been granted, you'll have the exclusive rights to make, use, or sell an invention. This essentially gives you a monopoly-like advantage over your idea.
Who invented the patent system? ›The first recorded patent for an industrial invention was granted in 1421 in Florence to the architect and engineer Filippo Brunelleschi.
What is the difference between owner and inventor of a patent? ›People commonly confuse patent inventorship with ownership — or assume that they are the same thing. But they are distinct concepts: The owner of a patent holds the legal rights and benefits granted by the patent. The inventor is not always the owner of the patent, and so doesn't always control those rights.
Who is the father of patents? ›George Washington was born on February 22, 1732. As we celebrate his 287th birthday, we remember him as the Father of His Country — and Father of the Patent System. This article was first published at BeemLaw.com.
What is the difference between assignee and inventor of a patent? ›Inventor: individual(s) who have contributed to the claimed invention. However, they may or may not have an ownership interest in the legal rights of the patent. Assignee: Organization(s) and individual(s) that have an ownership interest in the legal rights a patent offers. There may or may not be an assignee.